The SCR Engineering specializes in custom-made production of new equipment for semiconductor and photovoltaic industry and for chemical laboratories and for revision, checking, renovation and reparation of current equipment as FSI Mercury, FSI Saturn, FSI Titan and distribution of refurbished equipment. We are also suppliers of components and spare parts for semiconductor industry.

For our equipment we always use components according customer´s wish, as for example components from companies Nitta Moore Company, Entegris, Process Technology, Parker, SMC, Ham-Let, Omron, Turck and others.

The production of new equipment has recently been the prevailing part of our activities and is going to take even more significance. Our equipment is constructed as to be compatible with CE and SEMI standards. Control electronics is hermetically separated from the process part to avoid corrosion caused by aggressive chemical steams. Frames are produced from high quality plastics with long operating life as from PVDF, FRPP, PP or FM4910 compatible (Takiron, Corzan). Distributing systems of chemicals, DI water, nitrogen, flow-meters, filters and valves do not contain any metal components. All materials and components are in „High purity“ execution. The equipment is controlled by reliable and powerful control system with „friendly“ user interface. Control system for communication with operator has been MS Windows CE © compatible and a delivery in any language is possible.

CHEMICAL DELIVERY SYSTEMS

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Configuration: One or two drum configuration Maximum size of drum is 200 litres (55 gallons) FRPP frame FM4910 frame is available Mixing station configuration Stainless Steel model for flammable liquids PTFE diaphragm pump PFA housing with 10“ filter cartridge Close loop PFA pneumatic operated valves High purity	Process Control: PLC based controller HMI interface Windows CE © compatible Remote control / monitoring Computer network support
Chemicals: Sulfuric Acid Hydrochloric Acid Hydrofluoric Acid Nitric Acid Phosphoric Acid Ammonium Hydroxide Sodium Hydroxide Potassium Hydroxide Hydrogen Peroxide Chemical Mixture	Safety Features: Door with electronics sensor Spray guns Independent shut-down system Aspirator Leak sensors Inert gas purging On-line flow monitor Excess flow sensory

Automatic - Immersion Cleaning Systems

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Application Include: Buffered oxide etch (BOE) Hydrofluoric acid PAN etch (Phosphoric, Acetic, Nitric acids) Phosphoric acid Acetic acid SC1 mixture SC2 mixture Sulfuric acid and Hydrogen peroxide mixture	Tank Sizes: One or two wafer carriers Size from 4“ up to 8“ wafers Custom design tanks is available
Safety Features: Front door with electronics sensor Spray guns Aspirator Capacitive style liquid level sensor Inert gas purging Heater purge backpressure monitor Heater element over-temperature sensor Pump motor gas purge flow monitor	Temperature range: PVDF tanks up to 100°C PFA / PTFE tanks up to 180°C Quick Dump Rinse Tank up to 80°C
Process / Temperature Control: PLC based controller HMI interface +/- 0,2°C chemical stability attainable Windows © compatible SECSII/GEM protocol Computer network support Fully robotics arm	Cascading Quick Dump Rinser: Durable PP or PVDF construction Knife edge cascading inner weir overflow Top spray and bottom fill manifold Pneumatic dump door Bottom fill valve with bypass flow capability Hot DI water compatible
Heater configuration: Patented, gas purged, PTFE construction 120 volts to 600 volts, single or three phase available

Manual Batch - Immersion Systems

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Application Include: Buffered oxide etch (BOE) Hydrofluoric acid PAN etch (Phosphoric, Acetic, Nitric acids) Phosphoric acid Acetic acid SC1 mixture SC2 mixture Sulfuric acid and Hydrogen peroxide mixture Ozone	Tank Sizes: One or two wafer carriers Size from 4“ up to 8“ wafers Custom design tanks is available
Process / Temperature Control: PLC based controller HMI interface Local control terminals for each tank +/- 0,2°C chemical stability attainable Windows © compatible Computer network support	Temperature range: PVDF tanks up to 100°C PFA / PTFE tanks up to 180°C Quick Dump Rinse Tank up to 80°C
Heater configuration: Patented, gas purged, PTFE construction 120 volts to 600 volts, single or three phase available	Cascading Quick Dump Rinser: Durable PP or PVDF construction Knife edge cascading inner weir overflow Top spray and bottom fill manifold Pneumatic dump door Bottom fill valve with bypass flow capability Hot DI water compatible

Automatic Batch - Immersion Systems for Solar cells

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Application Include: Saw damage Texturing Acidic texturing Pre-diffusion cleaning PSG etch	Safety Features: Spray guns Aspirator Capacitive style liquid level sensor Inert gas purging Heater purge backpressure monitor Heater element over-temperature sensor Pump motor gas purge flow monitor Exhaust monitor
Configuration: Ultrasonic bath On-line chemical monitoring Built-in dryer Top cover for chemical baths Chemical dispensing manifold Additional ports for level sensing and automatic chemical fill Recirculation In-line filter chamber Chiller system Fume bezel Membrane style switch panel with process display for each tank	Process/Temperature Control: PLC based controller HMI interface +/- 0,5°C chemical stability attainable Windows © compatible Computer network support Fully robotics arm
Tank sizes: Wafer carriers for 50 or 100 wafers Size from 100x100 mm up to 210x210 mm wafers Custom design tanks is available	Cascading Rinser : Durable PP, PVDF or SS PFA coated construction Knife edge cascading inner weir overflow Top spray and bottom fill manifold Pneumatic dump valve Bottom fill valve with bypass flow capability Hot DI water compatible Quick Dump Option